
For air, space, and ground-based systems, there is a clear need for highperformance, lightweight, low-power, highly reliable computing on data-intensive applications. A data-intensive application is one in which there is a very large volume of data, which is often accessed in irregular patterns. Yet, despite the fact that application-specific integrated circuits (ASICs) are becoming more memory- intensive, commodity memory and ASIC design and manufacturing technologies are still on divergent paths.
This work explored the use of regular
fabrics for lowering the barrier to using
commodity memory technology for
memory-intensive ASICs. A regular fabric
is a system of circuits and design
methodologies that best utilizes the simple,
regular patterns that can be reliably
printed for logic, memory, and analog
circuits with a single, compatible, subwavelength
lithography setup. In particular,
results show that laying out logic
circuitry on regular grids that are based
on memory array spacing can substantially
improve the manufacturability of
memory-intensive ASIC designs. Regular
fabrics are especially conducive to ebeam
lithography, where electron beams
transcribe patterns directly to the silicon
wafer, without the use of photolithographic
masks. Because of this, regular
fabrics provide a path for cost-effective,
low-volume production by reducing
mask cost.
Given the base technology for implementing
memory-intensive ASICs that regular
fabric provides, a further challenge is
giving architects the tools to evaluate
tradeoffs and explore the range of possible
designs for complex, heterogeneous
ASIC designs. Such designs may include
many processor cores, interconnection
networks, I/O components, and multiple varieties of memory, including 3D stacks
or quilts. To address this challenge, both
midrange and high-level tools were developed
for modeling power, area, and timing
in multi- and many-core systems.